Leti, innovation
for industry
Contact: Fabrice Geiger (fabrice.geiger@cea.fr)
An integral part of a national network of high-tech platforms, the MOS and MEMS technology platforms bring together Leti’s resources for conducting applied research in micro- and nanotechnology.
Two Leti technology platforms are bridging the gap between upstream research and development of new micro and nanotechnology applications. The MOS 200/300 platform provides 200mm and 300mm CMOS wafer processing, which can be applied to both semiconductor and microsystem devices. The MEMS200 platform produces non-CMOS Micro-ElectroMechanical Systems (MEMS).
Both platforms are focused on the “More than Moore” initiative to develop new semiconduct
as well as to other high-tech platforms, it also receives research from the researchers of applied laboratories (e.g. Liten, CNRS/LTM)
During 2010, an innovative moving cleanroom system linked the two platforms, adding process flexibility and faster processing. Together, the two programs have 6,500m² of cleanroom space, 500 process tools and a combined staff of more than 450 people.