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Upcoming Event

> SPIE Advanced Lithography 2012

SPIE Advanced Lithography 2012


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12 - 16 February 2012
San Jose, California, USA



CEA-Leti will be present at SPIE Advanced Lithography 2012 :


Metrology :

  • “Potential new CD Metrology metric for future node production”

Johann Foucher, N.Griesbach Schuch Figueiro*
CEA/LETI-MINATEC Campus, * CEA-LETI/LTM-CNRS


  • "Overcoming silicon limitations: new 3D-AFM carbon tips with constant high-resolution for sub-28 nm node semiconductor requirements”

Johann Foucher*a, Sebastian W. Schmidtb, Ch. Penzkoferb, Bernd Irmerb
aCEA-Leti, MINATEC Campus, bnanotools GmbH, Munich, Germany



Process control :

  • “Spacer process and alignment assessment for SADP process”

Ludovic Lattard, CEA-Leti (France); Martin McCallum, Nikon Precision Europe GmbH (Germany) and Nikon Corp. (Japan); Robert Morton, Nikon Precision Europe GmbH (Germany); Katsushi Makino, Akira Tokui, Nobuyuki Takahashi, Tomoharu Fujiwara, Nikon Corp. (Japan) - Paper 8324-3 of Conference 8324


  • “Pattern density multiplication by direct self-assembly of block copolymers: toward 300mm CMOS requirements”

Raluca Tiron, Xavier Chevalier, Stéphanie Gaugiran, Jonathan Pradelles, Celine Lapeyres, Christophe Couderc, CEA-Leti (France); Laurent Pain, CEA-Leti (France); Christophe Navarro, Stephanie Magnet, Arkema S.A. (France); Thierry Chevolleau, Gilles Cunge, Guillaume Fleury, Georges Hadziioannou, CEA-Leti (France) - Paper 8324-23 of Conference 8324


  • “Self-assembly patterning using block copolymer for advanced CMOS technology: optimisation of plasma etching process”

Thierry Chevolleau, Gilles Cunge, Xavier Chevalier, Raluca Tiron, CEA-Leti (France); Maxime Darnon, Ctr. National de la Recherche Scientifique (France); Christophe Navarro, Stephanie Magnet, Arkema S.A. (France) - Paper 8328-20 of Conference 8328


  • “Sub-20nm Hybrid Lithography using Optical + Pitch-Division and e-Beam”

J. Belledent1, M. Smayling2, J. Pradelles1, L. Mage1, P. Pimenta-Barros1, S. Barnola1, B. Icard1, C. Lapeyre1, S. Soulan1, L. Pain1

1: CEA – Leti, 17 rue des martyrs, F-38054 GRENOBLE Cedex 9, France
2: Tela Innovations, Inc.485 Alberto Way, Suite 115, Los Gatos, CA 95032



For more information, visit SPIE site

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