Leti, innovation
for industry
CEA-Leti will be present at SPIE Advanced Lithography 2012 :
Johann Foucher, N.Griesbach Schuch Figueiro*
CEA/LETI-MINATEC Campus, * CEA-LETI/LTM-CNRS
Johann Foucher*a, Sebastian W. Schmidtb, Ch. Penzkoferb, Bernd Irmerb
aCEA-Leti, MINATEC Campus, bnanotools GmbH, Munich, Germany
Ludovic Lattard, CEA-Leti (France); Martin McCallum, Nikon Precision Europe GmbH (Germany) and Nikon Corp. (Japan); Robert Morton, Nikon Precision Europe GmbH (Germany); Katsushi Makino, Akira Tokui, Nobuyuki Takahashi, Tomoharu Fujiwara, Nikon Corp. (Japan) - Paper 8324-3 of Conference 8324
Raluca Tiron, Xavier Chevalier, Stéphanie Gaugiran, Jonathan Pradelles, Celine Lapeyres, Christophe Couderc, CEA-Leti (France); Laurent Pain, CEA-Leti (France); Christophe Navarro, Stephanie Magnet, Arkema S.A. (France); Thierry Chevolleau, Gilles Cunge, Guillaume Fleury, Georges Hadziioannou, CEA-Leti (France) - Paper 8324-23 of Conference 8324
Thierry Chevolleau, Gilles Cunge, Xavier Chevalier, Raluca Tiron, CEA-Leti (France); Maxime Darnon, Ctr. National de la Recherche Scientifique (France); Christophe Navarro, Stephanie Magnet, Arkema S.A. (France) - Paper 8328-20 of Conference 8328
J. Belledent1, M. Smayling2, J. Pradelles1, L. Mage1, P. Pimenta-Barros1, S. Barnola1, B. Icard1, C. Lapeyre1, S. Soulan1, L. Pain1
1: CEA – Leti, 17 rue des martyrs, F-38054 GRENOBLE Cedex 9, France
2: Tela Innovations, Inc.485 Alberto Way, Suite 115, Los Gatos, CA 95032
For more information, visit SPIE site