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> 2011 international conference on frontiers of characterization and metrology for nanoelectronics

2011 international conference on frontiers of characterization and metrology for nanoelectronics


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23-26 Mai 2011
Minatec - Grenoble

MINATEC Innovation Campus Is IC-FCMN’s First Conference Venue Outside U.S.


The International Conference on Frontiers of Characterization and Metrology for Nanoelectronics 2011 (IC-FCMN 2011) will be May 23-26 at MINATEC, an international center for micro- and nanotechnologies, in Grenoble, France.


The 8th annual conference, which is being held for the first time outside the United States, will attract participants from around the world to examine the latest advances in characterization and metrology that will help shape the future of the nanoelectronics revolution.


The conference will include more than two dozen invited papers.


IC-FCMN 2011 will allow extended interaction between characterization and metrology experts and users from industry and R&D labs. By providing an opportunity for attendees to share results and interests, the conference also will facilitate new research partnerships and help establish a common vision for meeting nanoelectronics characterization and metrology challenges.


The conference formerly was called “Characterization and Metrology for ULSI Technology.”


For more information and registration, visit http://www.nist.gov/pml/semiconductor/conference

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